JPH0122705B2 - - Google Patents

Info

Publication number
JPH0122705B2
JPH0122705B2 JP55123405A JP12340580A JPH0122705B2 JP H0122705 B2 JPH0122705 B2 JP H0122705B2 JP 55123405 A JP55123405 A JP 55123405A JP 12340580 A JP12340580 A JP 12340580A JP H0122705 B2 JPH0122705 B2 JP H0122705B2
Authority
JP
Japan
Prior art keywords
electron
sample
detection
electron beam
electron microscope
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55123405A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5673853A (en
Inventor
Bofuisu Gesuberutasu
De Rangu Hendoriku
Henrikasu Detsukaasu Nikoraasu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Koninklijke Philips Electronics NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninklijke Philips Electronics NV filed Critical Koninklijke Philips Electronics NV
Publication of JPS5673853A publication Critical patent/JPS5673853A/ja
Publication of JPH0122705B2 publication Critical patent/JPH0122705B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/21—Means for adjusting the focus
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2446—Position sensitive detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/24475—Scattered electron detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24571—Measurements of non-electric or non-magnetic variables
    • H01J2237/24578—Spatial variables, e.g. position, distance
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24592—Inspection and quality control of devices

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Electron Beam Exposure (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Automatic Focus Adjustment (AREA)
JP12340580A 1979-09-05 1980-09-05 Method and device for automatically correcting electron microscope Granted JPS5673853A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7906632A NL7906632A (nl) 1979-09-05 1979-09-05 Automatische bundelcorrektie in stem.

Publications (2)

Publication Number Publication Date
JPS5673853A JPS5673853A (en) 1981-06-18
JPH0122705B2 true JPH0122705B2 (en]) 1989-04-27

Family

ID=19833784

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12340580A Granted JPS5673853A (en) 1979-09-05 1980-09-05 Method and device for automatically correcting electron microscope

Country Status (7)

Country Link
US (1) US4379230A (en])
JP (1) JPS5673853A (en])
CA (1) CA1153131A (en])
DE (1) DE3032818A1 (en])
FR (1) FR2464558A1 (en])
GB (1) GB2059120B (en])
NL (1) NL7906632A (en])

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4567369A (en) * 1982-06-18 1986-01-28 National Research Development Corporation Correction of astigmatism in electron beam instruments
GB2123582B (en) * 1982-06-18 1986-01-29 Nat Res Dev Correction of astigmatism in electron beam instruments
NL8304217A (nl) * 1983-12-07 1985-07-01 Philips Nv Automatisch instelbare electronenmicroscoop.
JPS60147117A (ja) * 1984-01-10 1985-08-03 Fujitsu Ltd 電子ビ−ム装置の調整方法
US4948971A (en) * 1988-11-14 1990-08-14 Amray Inc. Vibration cancellation system for scanning electron microscopes
US5300776A (en) * 1992-09-16 1994-04-05 Gatan, Inc. Autoadjusting electron microscope
DE19802848B4 (de) * 1998-01-26 2012-02-02 Display Products Group,Inc. Verfahren und Vorrichtung zum Testen eines Substrats
US6770867B2 (en) 2001-06-29 2004-08-03 Fei Company Method and apparatus for scanned instrument calibration
EP1428006B1 (en) * 2001-01-26 2012-10-03 Fei Company Method and apparatus for scanned instrument calibration
EP1783811A3 (en) * 2005-11-02 2008-02-27 FEI Company Corrector for the correction of chromatic aberrations in a particle-optical apparatus
US20070134513A1 (en) * 2005-12-13 2007-06-14 Binney & Smith Chemiluminescent system
EP1953791A1 (en) * 2007-02-05 2008-08-06 FEI Company Apparatus for observing a sample with a particle beam and an optical microscope
EP2325862A1 (en) * 2009-11-18 2011-05-25 Fei Company Corrector for axial aberrations of a particle-optical lens
EP2511936B1 (en) 2011-04-13 2013-10-02 Fei Company Distortion free stigmation of a TEM

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3576438A (en) * 1969-04-28 1971-04-27 Bell Telephone Labor Inc Focus monitor for electron microscope including an auxiliary electron gun and focusing lens
JPS5433195B2 (en]) * 1972-05-16 1979-10-18
JPS4919627A (en]) * 1972-06-14 1974-02-21
JPS521869B2 (en]) * 1972-07-11 1977-01-18
US4038543A (en) * 1975-07-08 1977-07-26 Siemens Aktiengesellschaft Scanning transmission electron microscope including an improved image detector
DE2542356C2 (de) * 1975-09-19 1977-10-20 Siemens AG, 1000 Berlin und 8000 München Verfahren zur Fokussierung der Objektivlinse eines Korpuskular-Durchstrahlungs-Rastermikroskops und Einrichtung zur selbsttätigen Durchführung des Verfahrens, sowie Anwendung
DE2619739A1 (de) * 1976-04-30 1977-11-10 Max Planck Gesellschaft Durchstrahlungs-raster-korpuskularstrahlmikroskop mit unterteiltem detektor im primaerstrahlkegel
JPS5492050A (en) * 1977-12-29 1979-07-20 Jeol Ltd Method and apparatus for astigmatic correction of scanning electronic microscope and others
US4162403A (en) * 1978-07-26 1979-07-24 Advanced Metals Research Corp. Method and means for compensating for charge carrier beam astigmatism

Also Published As

Publication number Publication date
GB2059120B (en) 1983-07-13
GB2059120A (en) 1981-04-15
NL7906632A (nl) 1981-03-09
JPS5673853A (en) 1981-06-18
CA1153131A (en) 1983-08-30
US4379230A (en) 1983-04-05
FR2464558B1 (en]) 1983-12-30
DE3032818A1 (de) 1981-04-02
FR2464558A1 (fr) 1981-03-06
DE3032818C2 (en]) 1991-06-20

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